http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980040613-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980040613-A |
| titleOfInvention | Plasma Uniformity Control Method in Plasma Etching Equipment |
| abstract | A novel plasma uniformity control method is disclosed. By the arbitrary waveform and the modulation frequency in the predetermined frequency range, time modulation of the current in the main coil and the subcoil of the electromagnet of the plasma etching equipment is performed to change the arrangement of the magnetic field. Etch rate and etch uniformity can be controlled by time modulation of the magnetic field. |
| priorityDate | 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 |
Total number of triples: 9.