http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980040612-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980040612-A |
| titleOfInvention | Plasma Uniformity Control Method in Plasma Etching Equipment |
| abstract | A novel plasma uniformity control method is disclosed. Any waveform, the same frequency in a predetermined frequency range, and a controllable phase inversion between the modulations of the main coil and the subcoil of the electromagnet, change the placement of the magnetic field by time-modulating the current in the main and subcoils. Let's do it. Plasma uniformity may be controlled by controlling phase inversion between time-modulated currents of the electromagnet coil. |
| priorityDate | 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 |
Total number of triples: 9.