http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980033124-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L29-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1997-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980033124-A |
| titleOfInvention | Radiation sensitive composition |
| abstract | The present application includes resist materials such as quinonediazido-based photoactive compounds and alkali-soluble resins, and (A) 1 to 25% by weight of a propylene glycol derivative of Formula 1, andn n n (B) A radiation sensitive composition is described which contains a mixed solvent comprising 75 to 99% by weight of at least one solvent selected from propylene glycol monomethyl ether acetate and ethyl lactate.n n n Formula 1n n n R 1 -O-CH 2 CH (CH 3 ) -OR 2 n n n Wherein R, R 1 and R 2 are independently a hydrogen atom, an alkyl group and an acetyl group of 2 to 5 carbon atoms, the total number of carbons of R 1 and R 2 is less than 8, R 1 and R 2 are simultaneously hydrogen atoms is no.n n n The radiation sensitive composition is used in the manufacture of semiconductor devices and liquid crystal display devices. The solvent is safe for the human body and the amount of residual solvent in the resist film is small. |
| priorityDate | 1996-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 126.