http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980032539-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L45-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-375 |
| filingDate | 1997-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980032539-A |
| titleOfInvention | Chemically Amplified Resist Composition |
| abstract | The present invention provides a chemically amplified resist composition comprising a polymer of Formula 1 and a Photoacid Generator (PAG).n n n n n n n n n n Wherein R 1 and R 2 are C 0 -C 10 aliphatic hydrocarbons having hydroxy or carboxylic acid groups, R 3 is hydrogen or methyl, R 4 is t-butyl or tetrahydropyranyl, m and n are Is an integer.n n n The present invention also provides a chemically amplified resist composition comprising a polymer of formula (2) and PAG.n n n n n n n n n n Wherein x is a C 5 to C 8 cyclic or alicyclic compound, R 1 is selected from the group consisting of hydrogen and methyl, R 2 is t-butyl, tetrahydro While it is selected from the group consisting of pyranyl (Tetrahydropyranyl) and adamantyl (Adamantyl), m and n are integers n / (m + n) = 0.1-0.5.n n n According to the present invention, it is possible to use a developer used in a conventional method as a developer at the time of development, to have excellent etching resistance, and to provide excellent adhesion to the film quality. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100687464-B1 |
| priorityDate | 1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.