http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980026058-A
Outgoing Links
| Predicate | Object |
|---|---|
| filingDate | 1996-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980026058-A |
| titleOfInvention | Chemically Amplified Resist Composition |
| abstract | The present invention provides a chemically amplified resist composition comprising a polymer of Formula 1 and a Photo Acid Generator (PAG).n n n n n n n n n n Wherein R 1 is hydrogen or a methyl group, R 2 is a t-butyl group or tetrahydropyranyl group, to be. The chemically amplified resist of the present invention not only has excellent binding property of the film and is very resistant to etching, and has little reactivity to the concentration change of the developer, so that a general developer can be used as it is. |
| priorityDate | 1996-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.