http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980021748-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 1996-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1998-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-19980021748-A |
| titleOfInvention | Nitrogen concentration measurement method of nitride film by thermal oxidation |
| abstract | A method for indirectly measuring the nitrogen concentration in a nitride film using thermal oxidation is disclosed. To this end, the present invention, the first step of preparing two wafers with a nitride film prepared in the same characteristic atmosphere, and measuring the thickness of the nitride film with one of the wafers and analyzed the composition by XPS (X-ray Photoelectrons Spectroscopy) measurement method A second step of obtaining the nitrogen concentration of the nitride film, a third step of thermally oxidizing the film under a predetermined condition using the remaining one sheet of the wafer, and measuring the thickness of the thermal oxide film, and the second and third steps of A fourth step of plotting the result on a graph, a fifth step of repeating the steps 1 to 4 using another sample to arrange the relationship between the composition of the nitride film and the thermal oxide film, and the characteristics of the graph. The thermal oxidation process is performed in a sixth step of indirectly measuring the nitrogen concentration in the nitride film by performing a thermal oxidation process on the wafer on which the nitride film to be measured is formed. It provides a method of measuring the nitrogen concentration using the nitride film. Accordingly, by providing a method of indirectly measuring the nitrogen concentration in the nitride film using thermal oxidation, it is possible to quickly follow up in case of a problem, and to minimize damage due to poor quality of the product. |
| priorityDate | 1996-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.