| abstract |
It is an object of the present invention to provide a salt, an acid generator and a resist composition used in a resist composition capable of forming a resist pattern with excellent line edge roughness. A salt represented by formula (I), an acid generator containing the salt, and a resist composition. [In the formula, R 1 and R 2 are each independently a hydrogen atom, a hydroxyl group or a hydrocarbon group; m and n are each 1 or 2; Ar is a phenyl group which may have a substituent; Q 1 and Q 2 are each a fluorine atom or a perfluoroalkyl group; A 1 is a single bond, an alkanediyl group having 1 to 24 carbon atoms, or the like; Y represents a hydrogen atom or an alicyclic hydrocarbon group, the alicyclic hydrocarbon group has one or more substituents, or one or more of -CH 2 - contained in the alicyclic hydrocarbon group is -O-, -SO 2 - or -CO- is replaced by .] |