http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102491014-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
filingDate | 2022-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2023-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2023-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102491014-B1 |
titleOfInvention | Method of manufacturing transfer mask and developer |
abstract | An object of the present invention is to provide a technique for forming a resist pattern having a straight pattern edge while reducing resist pattern swelling, pattern collapse, and resist pattern distortion. A method of manufacturing a transfer mask, comprising the steps of preparing a substrate having a thin film, forming a resist film on the surface of the thin film, exposing the resist film, and developing the resist film after exposure. A step of forming a resist pattern by performing a resist pattern, and a step of etching a thin film using the resist pattern as a mask. In the step of forming the resist pattern, the resist film is formed of a chemically amplified and negative resist liquid. It is a resist film, and the developing solution used in the developing step contains solvent A and solvent B, which are organic solvents, and solvent C, which is an organic solvent and is less likely to dissolve the resist film than the solvent A and the solvent B, The boiling point of the solvent A is higher than that of the solvent C, and the boiling point of the solvent C is higher than that of the solvent B. |
priorityDate | 2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 198.