| abstract |
An object of the present invention is to provide a photosensitive siloxane resin composition capable of low-temperature curing, excellent storage stability and resolution, capable of suppressing development residues, high hardness, excellent chemical resistance, and substrate adhesion to obtain a cured film. do it with The present invention is a photosensitive siloxane resin composition containing (A) a polysiloxane, (B) a radical photopolymerization initiator, (C) a polyfunctional monomer, and (D) a phosphoric acid derivative amine salt. |