| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2017-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2023-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2023-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102487566-B1 |
| titleOfInvention |
High power electrostatic chuck with aperture-reducing plug in a gas hole |
| abstract |
An electrostatic chuck for supporting a workpiece for processing such as high power plasma processing is described. In embodiments, the chuck includes a top plate for supporting the workpiece, the top plate having an electrode for gripping the workpiece; a cooling plate under the top plate for cooling the top plate; a gas hole penetrating the cooling plate and the top plate for feeding gas to the workpiece through the top plate; and an aperture-reducing plug in the cooling plate gas hole for directing the gas flow through the hole. |
| priorityDate |
2016-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |