http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102487249-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-38 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-06 |
filingDate | 2016-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2023-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2023-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102487249-B1 |
titleOfInvention | Etching solution composition for a tungsten layer |
abstract | The present invention relates to a tungsten film etchant composition containing N-methyl morpholine N-oxide and water, wherein only tungsten metal is used without etching titanium nitride or aluminum titanium carbide films. It has the effect of being selectively etched. |
priorityDate | 2015-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.