http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102484977-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2017-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2023-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2023-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102484977-B1 |
| titleOfInvention | Etching compositions and etching method using the same |
| abstract | The present invention relates to an etching composition, an etching method, and a method for manufacturing a semiconductor device using the same, and more particularly, in the case of wet etching in a semiconductor manufacturing process, a high selectivity capable of selectively removing a nitride film while minimizing an etching rate of an oxide film It relates to a method for manufacturing a semiconductor device including an etching composition containing a compound of ratio and an etching process using the etching composition. |
| priorityDate | 2017-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.