http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102482166-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J23-745 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
filingDate | 2015-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2022-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2022-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102482166-B1 |
titleOfInvention | Composition for tungsten cmp |
abstract | A chemical mechanical polishing composition for polishing a substrate having a tungsten layer comprises an aqueous liquid carrier, a colloidal silica abrasive dispersed in the liquid carrier and having a permanent positive charge of at least 6 mV, an amine compound as a solution in the liquid carrier, and containing iron. Contains accelerators. A method of chemical mechanical polishing of a substrate comprising a tungsten layer polishes a substrate by contacting the substrate with the polishing composition described above, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate. includes doing |
priorityDate | 2014-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 197.