http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102469463-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2018-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102469463-B1 |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and electronic device manufacturing method |
| abstract | Provision of an actinic ray-sensitive or radiation-sensitive resin composition capable of imparting a pattern with excellent resolution, a resist film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and an electronic device manufacturing method do. An actinic ray-sensitive or radiation-sensitive resin composition is used for forming a pattern having a film thickness of 1 μm or more, contains a resin, and contains an impurity having absorption at a wavelength of 248 nm, which is 1.00% by mass or less relative to the resin. |
| priorityDate | 2017-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 180.