http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102467795-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F15-065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate | 2017-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102467795-B1 |
| titleOfInvention | Method for producing thin inorganic films |
| abstract | The present invention is particularly in the field of methods for producing thin inorganic films on substrates by atomic layer deposition processes. The present invention relates to a method for producing an inorganic film comprising depositing on a solid substrate a compound of formula (I): In the above formula, M is Mn, Ni or Co; X is a ligand coordinated to M, n is 0, 1, 2, 3 or 4; R 1 is an alkyl group, an alkenyl group, an aryl group, a halogen or a silyl group; R 2 is an alkyl group, an alkenyl group, an aryl group or a silyl group; p and q are 1 or 2, where p + q = 3; m is 1, 2 or 3; |
| priorityDate | 2016-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.