abstract |
An object of the present invention is to provide a nonionic compound, a resin, and a resist composition for use in a resist composition having few defects and capable of producing a resist pattern with excellent CD uniformity. A resin comprising a structural unit derived from a nonionic compound having a group represented by formula (Ia), and a resist composition comprising the resin. In the formula (Ia), R 2 represents a group having an alicyclic hydrocarbon group having 3 to 18 carbon atoms. Rf 1 and Rf 2 each independently represent a perfluoroalkyl group having 1 to 4 carbon atoms. * indicates a bond. |