http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102461088-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102461088-B1 |
| titleOfInvention | Positive-type photosensitive resin composition |
| abstract | [PROBLEMS] To provide a positive photosensitive resin composition which is excellent in adhesiveness and patternability and can provide a cured product having good elongation. [Solution] (A) a polybenzoxazole precursor, (B) a photoacid generator; (C) a silane coupling agent comprising a nitrogen atom, and (D) Adhesive improving agent having an amine value of 20 mgKOH/g or more and 100 mgKOH/g or less A positive photosensitive resin composition comprising a. |
| priorityDate | 2019-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.