| abstract |
A resist composition that generates an acid upon exposure and changes solubility in a developer by the action of an acid, comprising: a base component (A) whose solubility in a developer changes due to the action of an acid; A resist composition comprising an acid generator component (B), wherein the acid generator component (B) contains a compound (B0-1) represented by the following general formula (b0) [wherein Ra 1 is An aromatic ring is meant, Ra 01 is an alkyl group having 5 or more carbon atoms which may have a substituent, and Ra 02 and Ra 03 are each independently an alkyl group having 1 to 10 carbon atoms which may have a substituent. n1 is an integer of 1-5, n2 is an integer of 0-2, and n3 is an integer of 0-4. X - is a counter anion.] |