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filingDate 2018-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102434297-B1
titleOfInvention Substrate processing method and substrate processing apparatus
abstract Provided are a substrate processing method and a substrate processing apparatus capable of improving the problems of pattern collapse and particles. A substrate treatment method comprises: a surface modification step of modifying the surface of a substrate having an oxide on its surface to improve roughness of the surface; supplying a treatment liquid to the modified surface of the substrate; and a surface cleaning process of cleaning the surface of the substrate by a method, and a hydrophobization process of supplying a hydrophobizing agent to the cleaned surface of the substrate to make the surface of the substrate hydrophobic.
priorityDate 2018-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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