abstract |
The present invention provides a resist composition that generates an acid upon exposure and changes solubility in a developer by the action of the acid, comprising a base component (A), wherein the base component (A) is obtained by formula (a9-1) ) of the structural unit (a91) or the structural unit (a9-2) represented by the formula (a9-2) and the structural unit (a10) represented by the formula (a10-1) in an amount of 30 mol% or more, and polarity by the action of an acid Provided are a resist composition comprising a copolymer (A1) having 45 mol% or more of the structural unit (a1) containing an increasing acid-decomposable group, and a resist pattern forming method using the same. In each formula, R is a hydrogen atom or the like; Ya 91 and Ya x1 are a single bond or a divalent linking group; R 91 is a hydrocarbon group having 1 to 20 carbon atoms, etc.; R 92 is an oxygen atom or the like; j and n ax1 are 1 to 3 An integer of; Wa x1 represents a (n ax1 +1) valent aromatic hydrocarbon group. |