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filingDate 2019-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102422539-B1
titleOfInvention Photocurable composition for imprint
abstract [Problem] To provide a novel photocurable composition for imprinting. [Solutions] A photocurable composition for imprint comprising the following (a) component, the following (b) component, the following (c) component, and the following (d) component, the compound having an ethylenically unsaturated group contained in the composition. With respect to 100 mass parts in total, 10 mass parts - 40 mass parts of this (a) component, this (b) component 10 mass parts - 50 mass parts, this (c) component 1 mass part - 10 mass parts, this (d) It is a photocurable composition for imprints whose component is 0.1 mass part - 5 mass parts. (a): a primary particle diameter of 1 nm to 100 nm, surface-modified silica particles with a functional group having an ethylenically unsaturated group (b): a monofunctional (meth) acrylate compound having an ethylenically unsaturated group (c): having an ethylenically unsaturated group Polyrotaxane (d): photoradical initiator
priorityDate 2018-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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