http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102419121-B1

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filingDate 2019-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102419121-B1
titleOfInvention Photoresist Patterning Process Supports Two-Step Phosphor-Deposition to Form LED Matrix Arrays
abstract A method for low temperature curing of silicon structures is described, comprising the steps of providing patterning photoresist structures on a substrate. The photoresist structures define at least one open area that can be at least partially filled with a condensation cured silicone system. Vapor catalytic deposition is used to accelerate the curing of the condensation cured silicone, and the photoresist structure is removed leaving free-standing or layered silicon structures. Phosphor-containing silicon structures that can be coated with a reflective metal or other material are made possible by this method.
priorityDate 2018-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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