http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102415696-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2015-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102415696-B1 |
| titleOfInvention | Polishing slurry composition |
| abstract | The present invention relates to a polishing slurry composition, and the polishing slurry composition according to an embodiment of the present invention comprises: abrasive particles; oxidizing agent; compounds that promote oxidation and prevent corrosion; and an anionic polymer; the polishing slurry composition of the present invention forms a protective film on the tungsten surface to weaken the etching force (etching force) by the oxidizing agent, thereby exhibiting an excellent anti-corrosion effect without lowering the polishing rate. However, since iron ions or iron compounds are not used, defects on the polishing surface that may be caused by iron ions or iron compounds can be reduced, and dispersion stability and storage stability are excellent. |
| priorityDate | 2015-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 219.