http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102407808-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31155 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3215 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31155 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3215 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3215 |
| filingDate | 2017-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102407808-B1 |
| titleOfInvention | Functionalized Guide Pattern Formation Method for Grapho Epitaxy Method |
| abstract | Disclosed is a method for forming a functionalized guide pattern, intended for self-assembly of block copolymers by graphoepitaxy, comprising the following steps: a first functionalized layer (2) on a substrate (1) ) to form; depositing a protective layer (3) on said first functionalized layer (2); forming a guide pattern (4) on the protective layer (3), the guide pattern (4) comprising at least one cavity (7) opening on the protective layer (3), the cavity (7) ) includes the lower surface 6 and the side wall 5 ; - (104) a protective layer 3 located on the lower surface of the cavity by exposure to ion bombardment so that the implanted portion 9 of the protective layer can be etched selectively with respect to the non-implanted portion 8 of the protective layer ) implanting ions with an atomic number less than 10 into the portion 9; forming a second functionalized layer (10) in the cavity (7), the second functionalized layer (10) being a first part disposed on the protective layer (3) on the lower surface (6) of the cavity (11) and a second portion (12) disposed on a sidewall (5) of said cavity; and a portion 13 of the first functionalized layer located on the underside of the cavity by selectively etching the implanted portion 9 of the protective layer and the first portion 11 of the second functionalized layer 10 step to expose. |
| priorityDate | 2016-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.