http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102400258-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-3276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 |
| filingDate | 2017-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102400258-B1 |
| titleOfInvention | Etchant composition for etching metal layer and manufacturing method of forming conductive pattern using the same |
| abstract | The present invention relates to a metal film etchant composition, and more particularly, 40 to 60% by weight of phosphoric acid, based on the total weight of the composition; 3 to 8% by weight of nitric acid; 5 to 20% by weight of acetic acid; 0.1 to 3% by weight of phosphate; 0.1 to 6% by weight of an anti-adsorption agent comprising at least one of a glycol-based compound or a polyphosphate group-containing compound; and a residual amount of water, effectively preventing the etched metal from being re-adsorbed on the substrate, and exhibiting excellent etching properties for the target layer without damaging the underlying layer. |
| priorityDate | 2017-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.