| abstract |
A Si-containing film forming composition comprising a carbosilane substituted amine precursor is disclosed. The carbosilane substituted amine precursor has the formula (R 1 ) a N(-SiHR 2 -CH 2 -SiH 2 R 3 ) 3 -a , wherein a is 0 or 1; R 1 is H, C 1 to C 6 an alkyl group or halogen; R 2 and R 3 are each independently H; halogen; an alkoxy group of the formula OR' (wherein R' is an alkyl group (C 1 to C 6 )); , each R″ is independently an alkylamino group of H, a C 1 -C 6 alkyl group, a C 1 -C 6 alkenyl group, or a C 3 -C 10 aryl or heterocycle group. Also disclosed are methods for synthesizing carbosilane substituted amine precursors and their use for deposition methods. |