http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102389260-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102389260-B1 |
| titleOfInvention | Composition for hard mask |
| abstract | The composition for a hard mask of the present invention includes a linker compound having a specific structure and a polymer of an aromatic compound containing a hydroxyl group, an ether group, or a thioether group. A hard mask having improved etch resistance, solubility, and flatness can be formed from the composition for a hard mask. |
| priorityDate | 2017-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.