http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102388636-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68714 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0445 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F26B5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F26B5-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F26B5-00 |
| filingDate | 2020-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102388636-B1 |
| titleOfInvention | Substrate processing method and substrate processing apparatus |
| abstract | In the substrate processing method, a sublimable material-containing liquid, which is a solution containing a sublimable material that changes from a solid to a gas without passing through a liquid and a solvent for dissolving the sublimable material, is supplied to the surface of the substrate on which the pattern is formed, A sublimable material-containing liquid film forming step of forming a liquid film of the sublimable material-containing liquid covering the surface of the substrate on the surface of the substrate, and evaporating the solvent from the liquid film to form a solid of the sublimable material, A transition state film forming process of forming a transition state film in a transition state before crystallization of the solid of the sublimable material on the surface of the substrate, and maintaining the solid of the sublimable material in the transition state before crystallization of the substrate and removing the transition state film from the surface of the substrate by subliming the solid of the sublimable material on the surface. |
| priorityDate | 2019-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 62.