http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102383696-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 |
| filingDate | 2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102383696-B1 |
| titleOfInvention | Photosensitive resin composition and photocurable protective layer formed from the same |
| abstract | The photosensitive resin composition according to embodiments of the present invention is an alkali including a first epoxy-based resin and an acrylate-based second resin including a heterocyclic epoxy-containing repeating unit, a glycidyloxy group-containing repeating unit, and a carboxyl group-containing repeating unit It contains a soluble resin, a siloxane-based binder including an aromatic ring and an acryl group, a photopolymerizable compound, a photoinitiator, and a solvent. A photocurable protective film having excellent solvent resistance and chemical resistance may be formed from the photosensitive resin composition. |
| priorityDate | 2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.