| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2015-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2022-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102377868-B1 |
| titleOfInvention |
Substrate processing system, substrate cleaning method and storage medium |
| abstract |
It is to obtain high particle removal performance. A substrate processing system according to an embodiment includes a holding unit and a removal liquid supply unit. The holding unit holds the substrate on which the processing film is formed, which contains an organic solvent and a polymer that contains a fluorine atom and is soluble in the organic solvent. The removal liquid supply part supplies the removal liquid which removes a process film with respect to the process film|membrane on a board|substrate. |
| priorityDate |
2014-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |