Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
filingDate |
2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2022-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2022-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102376835-B1 |
titleOfInvention |
Semiconductor device manufacturing method, substrate processing apparatus and program |
abstract |
It is possible to reduce the factor inhibiting the film formation of the metal film. A metal-containing gas and a reducing gas containing silicon and hydrogen and containing no halogen are simultaneously supplied to the substrate, and the pressure in the processing chamber while supplying at least the reducing gas is 130 Pa or more and less than 3990 Pa. a first step of setting the values within the range; a second step of removing the metal-containing gas and the reducing gas remaining in the processing chamber; a third step of supplying a nitrogen-containing gas to the substrate; A fourth process of removing the remaining nitrogen-containing gas is sequentially repeated to form a metal nitride film substantially free of silicon atoms on the substrate. |
priorityDate |
2017-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |