http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102373917-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102373917-B1 |
| titleOfInvention | Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition |
| abstract | A method of forming a film on a patterned surface of a substrate by an atomic layer deposition (ALD) process, the method comprising: adsorbing a first precursor containing intramolecular silicon or metal to the patterned surface; adsorbing a second precursor that does not contain intramolecular silicon or metal on the first precursor adsorbed surface; exposing the second precursor adsorbed surface to an excited reactant to oxidize, nitridize or carbonize the adsorbed precursors to the surface of the substrate; and repeating the above cycle to form a film on the patterned surface of the substrate. |
| priorityDate | 2013-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.