http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102371936-B1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2019-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102371936-B1
titleOfInvention Coating method of semiconductor parts with excellent plasma erosion resistance and mechanical properties
abstract Disclosed is a method for coating a semiconductor component having excellent plasma erosion resistance and mechanical properties, which improves mechanical rigidity of semiconductor components with plasma erosion resistance by adding oxide particles as a reinforcing agent to a yttrium-based fluoride base. A method for coating a semiconductor component having excellent plasma erosion resistance and mechanical properties according to the present invention comprises the steps of: (a) preparing a semiconductor component; and (b) spray-coating a reinforcing agent together with yttrium-based fluoride on the surface of the semiconductor component, wherein the reinforcing agent comprises oxide particles.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102517083-B1
priorityDate 2019-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 55.