| abstract |
To provide a cleaning method, a cleaning device, a storage medium, and a cleaning composition capable of effectively removing a target layer by decomposing or modifying the layer to be treated at a higher temperature than before. In a state in which the substrate including the target layer is heated, the vapor of the component (A) capable of decomposing the target layer is supplied to the substrate, and then the target layer reacted with the component (A) is removed from the substrate. As component (A), nitric acid or sulfonic acid is preferable. The sulfonic acid is preferably a fluorinated alkylsulfonic acid. |