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filingDate 2021-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102367525-B1
titleOfInvention Semiconductor device and method for manufacturing the same
abstract A thin film transistor using an oxide semiconductor WHEREIN: Let it be one of the subject to improve the field effect mobility. Moreover, even if it improves the field effect mobility of a thin film transistor, it makes it one of the subject to suppress the increase of an off-state current. In a thin film transistor using an oxide semiconductor layer, between the oxide semiconductor layer and the gate insulating layer, a semiconductor layer having a higher electrical conductivity than the oxide semiconductor layer and a thin film thickness is formed to improve the field effect mobility of the thin film transistor Therefore, it is possible to suppress an increase in the off current.
priorityDate 2008-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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