http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102367254-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2015-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102367254-B1 |
| titleOfInvention | Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting film |
| abstract | The present invention provides a film that can easily form a pattern and has excellent adhesion to various film properties, particularly substrates used for circuit boards, and furthermore, reliability as an electric/electronic component, particularly alkali resistance An object of the present invention is to provide a coating for protecting electric/electronic components that is excellent and highly reliable. In order to solve the above problems, the present invention, (A) a silicone skeleton-containing high molecular compound having a weight average molecular weight of 3,000 to 500,000 having a repeating unit of formula (1); [R 1 to R 4 are monovalent hydrocarbon groups, m is 1 to 100, a, b, c, d is 0 or a positive number, a+b>0, a+b+c+d=1. X is a divalent organic group of Formula (2), Y is a divalent organic group of Formula (3). (W and V are divalent organic groups, n and p are 0 or 1, R 5 to R 8 are alkyl or alkoxy groups, k and h are 0, 1 or 2.)] (B) a polyhydric phenol compound; (C) a photoacid generator, and (D) solvent To provide a chemically amplified negative resist material comprising: |
| priorityDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 600.