http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102361263-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102361263-B1 |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, production method of resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method of manufacturing an electronic device |
| abstract | It has excellent resolution and roughness characteristics, suppresses the occurrence of scum, has excellent CDU, and has excellent stability over time. Provision of a manufacturing method, and an actinic ray-sensitive or radiation-sensitive film using the said composition, a pattern formation method, and the manufacturing method of an electronic device. The actinic-ray-sensitive or radiation-sensitive resin composition contains the following (A)-(C), and content of the compound whose pKa of a conjugated acid is 4.0 or more is 1 ppm or less on a mass basis with respect to total solid. (A) a resin having a repeating unit represented by the general formula (1), which is decomposed by the action of an acid to increase the solubility in an alkali developer; (B) a compound that generates an acid upon irradiation with actinic rays or radiation; (C) A fluorine-containing compound having a group that is decomposed by the action of an alkaline developer and increases solubility in an alkaline developer In general formula (1), R< 1 > represents a hydrogen atom or a monovalent organic group. X 1 represents a divalent linking group. Y 1 and Z 1 each independently represent a monovalent organic group. Y 1 and Z 1 may be linked to form a ring. |
| priorityDate | 2018-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 261.