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filingDate 2018-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102361083-B1
titleOfInvention Method for manufacturing fluorocarbon thin film and fabrication equipment therof
abstract The present invention provides a method for producing a fluorocarbon thin film capable of sputtering even at lower energy by stably forming a plasma even with DC and MF power supply methods widely used industrially by imparting conductivity to a fluorine-based polymer having super water repellency and high insulation properties, and a method thereof It relates to a continuous roll-to-roll sputtering deposition system for manufacturing.
priorityDate 2015-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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