http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102347596-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2015-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102347596-B1 |
| titleOfInvention | Composition of aqueous cleaner for removing residue |
| abstract | The present invention relates to an aqueous detergent composition, and more particularly, to an aqueous detergent composition comprising an inorganic fluorine compound, an aminosilane compound, a polar organic solvent, and water. The aqueous cleaner composition not only effectively removes residues generated on the substrate after ion implantation, etching and/or ashing process, but also has very low corrosiveness to the insulating film and metal film on the substrate, thereby greatly improving the productivity and reliability of the semiconductor manufacturing process. can |
| priorityDate | 2015-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 142.