http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102341492-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2017-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102341492-B1 |
| titleOfInvention | Radiation-sensitive resin composition, process for forming resist pattern, radiation-sensitive acid generator, and compound |
| abstract | [Problem] An object of the present invention is to provide a radiation-sensitive resin composition having excellent LWR performance and the like. [Solutions] The present invention is a radiation-sensitive resin composition comprising a polymer having a first structural unit containing an acid-dissociable group, a compound represented by formula (1), and a solvent. In Formula (1), R< 1> and R< 2> are monovalent organic groups which do not contain a hydrogen atom or a C1-C20 fluorine atom. R 3 , R 4 , R 5 , R 6 and R 7 are a hydrogen atom, a fluorine atom, or a monovalent organic group having 1 to 20 carbon atoms. However, at least one of R 1 , R 2 , R 3 and R 4 represents a group represented by OR Q . R Q is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R 1 and R 2 , R 1 and R 3 , R 1 and R 5 , R 3 and R 4 , R 3 and R 5 , or R 5 and R 6 are taken together, and together with the carbon atom to which they are attached, reduce water 3 to You may comprise the ring structure of 20. Y - is SO 3 - or COO - . X + is a monovalent radiation-sensitive onium cation. |
| priorityDate | 2016-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.