| abstract |
Provided are an actinic ray-sensitive or radiation-sensitive resin composition, a resist film, a pattern formation method, and a method for manufacturing an electronic device, which can obtain a pattern excellent in LER performance and suppress the line width change of the pattern due to delayed standing . The actinic ray-sensitive or radiation-sensitive resin composition is a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected by an acid leaving group, and is a first photo-acid generator that generates an acid having a pka of -2.00 to 2.00, When the generated acid is a carboxylic acid, a first photo-acid generator having a pka of the carboxylic acid of -2.00 or more and less than 1.00, and a second photo-acid generator generating a carboxylic acid having a pka of 1.00 or more are included. |