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filingDate 2021-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102335247-B1
titleOfInvention Image reversal with ahm gap fill for multiple patterning
abstract A method and apparatus for multiple patterning using image conversion are provided. The method may include depositing a gap-fill etchable hard mask using a deposition-etch-ash method to fill a gap in a pattern of a semiconductor substrate and removing the spacer etch step using a single-etch planarization method. can This method can be performed for double patterning, multiple patterning and two-dimensional patterning techniques in semiconductor manufacturing.
priorityDate 2012-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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