http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102332893-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-12
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-12
filingDate 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102332893-B1
titleOfInvention Method for a variety metal bonding on precious metals sputtering target decrease raw materials and the sputtering target prepared thereby
abstract The present invention relates to a sputtering target in which the amount of precious metal used is reduced by using a three-dimensional profile of the waste metal target used in the sputtering process, and a method for manufacturing the same.
priorityDate 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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