| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-124 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-16 |
| filingDate |
2014-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102331036-B1 |
| titleOfInvention |
Etching solution composition and etching method using the same |
| abstract |
The present invention relates to (A) a source of copper ions; (B) an organic acid ion source having at least one carboxyl group in the molecule; (C) a source of fluorine ions; (D) an etch control agent, a surface oxidizing agent, or a combination thereof as a first additive; and (E) an etching solution composition including a surfactant as a second additive, and a method for etching a multilayer film using the same. |
| priorityDate |
2014-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |