http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102327783-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-066 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102327783-B1 |
| titleOfInvention | Composition for forming underlayer film for electronic wiring resist and containing lactone-structure-containing polymer |
| abstract | [Problem] To provide a resist underlayer film for electron beam lithography, which reduces adverse effects due to an underlying substrate or electron beam and forms a good straight-shaped resist pattern. [Solutions] An electron beam resist underlayer film forming composition comprising a polymer including a unit structure having a lactone ring and a unit structure having a hydroxyl group. The polymer is a polymer obtained by copolymerizing a monomer mixture comprising lactone (meth) acrylate, hydroxyalkyl (meth) acrylate, and phenyl (meth) acrylate or benzyl (meth) acrylate. An electron beam resist underlayer film forming composition is applied on a substrate and heated to form an electron beam resist underlayer film, an electron beam resist is coated thereon, and an electron beam is irradiated to the substrate coated with the electron beam resist underlayer film and the electron beam resist, and development; A method of manufacturing a semiconductor device in which an image is transferred onto a substrate by dry etching to form an integrated circuit device. |
| priorityDate | 2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 255.