| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B1-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49826 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B1-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2021-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102323167-B1 |
| titleOfInvention |
Method and apparatus for purging and plasma suppression in a process chamber |
| abstract |
A substrate processing system includes a head portion and a stem portion and a showerhead for delivering a precursor gas into a processing chamber. A baffle has a base portion having an outer diameter greater than an outer diameter of the head portion of the showerhead. The baffle includes a dielectric material and is disposed between a head portion of the showerhead and an upper surface of the processing chamber. |
| priorityDate |
2013-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |