http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102322420-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2014-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102322420-B1 |
| titleOfInvention | Low defect chemical mechanical polishing composition |
| abstract | The present invention provides as initial ingredients: water, colloidal silica abrasive; and an additive according to formula (I). |
| priorityDate | 2013-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.