| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-10325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0227 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-342
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1606
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02129
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-16 |
| filingDate |
2019-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102314740-B1 |
| titleOfInvention |
Masking block that is easily bondable and debondable, method for manufacturing masking block and method for forming pattern of two-dimensional material using masking block |
| abstract |
The disclosed masking block includes a base substrate, a gamma alumina thin film disposed on the base substrate, and an h-BN thin film disposed on the gamma alumina thin film and doped with carbon and oxygen. The carbon content of the h-BN thin film is 1 at% to 15 at%. |
| priorityDate |
2019-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |