http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102313191-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 |
| filingDate | 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102313191-B1 |
| titleOfInvention | Novolac-type resins and resist materials |
| abstract | A novolak-type resin excellent in general performance such as heat resistance, alkali developability, photosensitivity, and resolution, a photosensitive composition containing the novolak-type resin, a curable composition containing the novolak-type resin and a cured product thereof, the photosensitive composition or A resist material formed using a curable composition is provided. A novolak-type resin comprising a compound (A) having a tris(hydroxyaryl)methine group and an aldehyde compound (B) as essential reaction raw materials, a photosensitive composition containing the novolak-type resin, and the novolak-type resin It depends on a curable composition, its hardened|cured material, and the resist material formed using the said photosensitive composition or curable composition. |
| priorityDate | 2016-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 318.