http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102311193-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2014-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102311193-B1 |
| titleOfInvention | A stable, concentratable silicon wafer polishing composition and related methods |
| abstract | The present invention is water; abrasive; cations according to formula (I); and piperazine or a piperazine derivative according to formula (II); and, optionally, a pH adjusting agent, wherein the composition exhibits a silicon removal rate of at least 300 nm/min. The present invention also provides methods of making and using stable and condensable chemical/mechanical polishing compositions. |
| priorityDate | 2013-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.